RF Power for Plasma Processing

"RF Power for Plasma Processing" provides an introduction to RF systems as applied to plasma processing. Topics include:

• Fundamentals of the glow discharge, RF plasma and sputtering
• RF delivery system from generator through the match to the chamber
• Transmission line theory
• RF power components
• The function of the match and various types of matching network
• Tuning
• Diagnostics and troubleshooting

Participants will learn about RF systems through the set up and operation a small sputtering system. This will include striking the plasma, optimizing power transfer to the plasma through the matching network and applying a V/I Probe as a tool for RF system diagnostics.

Training options for this topic:

Open-enrollment classroom training

Customized training event

Download "Technical Training from MKS"

Need help?

Contact MKS Instruments by sending an email or call 800-227-8766 or 978-284-4000.